Influence of Diamond Purity to Amorphous Growth In-Liquid Plasma Chemical Vapor Deposition (CVD) Method
Abstract
Diamond is one of the most remarkable natural materials, with several possible excellent physical properties in a wide range of applications. Natural diamonds form under high temperatures and high pressure, at least 250-300 km underneath the earth's mantle. However, diamonds are so rare in nature, so that command a high price. Because of that many researchers tried to grow synthetic diamonds in laboratories to utilize tremendous properties. This research investigates influence of purity of surface single crystal diamond to diamond and amorphous growth using the in-liquid plasma CVD technique. The experiment utilizes a X5CrNi18-10(JIS:SUS 304) substrate pre-embedded with single-crystal diamond seeds. Following deposition, substrate characterization using Scanning Electron Microscopy to observe morphology and Raman spectroscopy to confirm quality of film growth. The impurity at diamond seed can disturbed lattice arrangement such as interstitial, vacancy or substitutional atoms. This reason show that impurities can proposed amorphous growth in deposit film.
Keywords: Amorphous, CVD, Diamond and Growth
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